发明名称 VACUUM PRESSURE CONTROL SYSTEM AND VACUUM PRESSURE CONTROL PROGRAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a vacuum pressure control system capable of improving pressure control responsiveness. Ž<P>SOLUTION: In the vacuum pressure control system configured to adjust the opening of a vacuum proportional on-off valve 16 to feedback control a vacuum pressure in a reaction chamber 10 to a target pressure, a preload pressure value (a leak starting position of an O-ring 49) is calculated from the vacuum pressure in the reaction chamber 10 or the vacuum target pressure, and the preload pressure value is taken as a lower limit value of the feedback control. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010152763(A) 申请公布日期 2010.07.08
申请号 JP20080331674 申请日期 2008.12.26
申请人 CKD CORP 发明人 KONO TETSUJIRO
分类号 G05D16/20;F16K51/02 主分类号 G05D16/20
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