发明名称 |
METHOD OF FORMING FERROMAGNETIC MATERIAL, TRANSISTOR AND METHOD OF MANUFACTURING THE SAME |
摘要 |
The present invention provides a method of forming a ferromagnetic material, characterized by including: forming a magnetic element layer 20 on a semiconductor layer 16 formed on an inhibition layer 14; and forming a ferromagnetic layer of a Heusler alloy layer 26 on the inhibition layer 14 by heat treatment to induce the semiconductor layer 16 and the magnetic element layer 20 to react with each other, and a transistor, and a method of manufacturing the same. According to the present invention, the inhibition layer for inhibiting a reaction of the semiconductor layer and the magnetic element layer restricts a semiconductor to be supplied for a reaction of the semiconductor and the magnetic element. Therefore, it is possible to form a ferromagnetic material having a high composition ratio of a magnetic element.
|
申请公布号 |
US2010171158(A1) |
申请公布日期 |
2010.07.08 |
申请号 |
US20080450355 |
申请日期 |
2008.03.26 |
申请人 |
TOKYO INSTITUTE OF TECHNOLOGY |
发明人 |
SUGAHARA SATOSHI;TAKAMURA YOTA |
分类号 |
H01L29/82;H01L21/441;H01L29/43 |
主分类号 |
H01L29/82 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|