发明名称 METHOD OF FORMING FERROMAGNETIC MATERIAL, TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 The present invention provides a method of forming a ferromagnetic material, characterized by including: forming a magnetic element layer 20 on a semiconductor layer 16 formed on an inhibition layer 14; and forming a ferromagnetic layer of a Heusler alloy layer 26 on the inhibition layer 14 by heat treatment to induce the semiconductor layer 16 and the magnetic element layer 20 to react with each other, and a transistor, and a method of manufacturing the same. According to the present invention, the inhibition layer for inhibiting a reaction of the semiconductor layer and the magnetic element layer restricts a semiconductor to be supplied for a reaction of the semiconductor and the magnetic element. Therefore, it is possible to form a ferromagnetic material having a high composition ratio of a magnetic element.
申请公布号 US2010171158(A1) 申请公布日期 2010.07.08
申请号 US20080450355 申请日期 2008.03.26
申请人 TOKYO INSTITUTE OF TECHNOLOGY 发明人 SUGAHARA SATOSHI;TAKAMURA YOTA
分类号 H01L29/82;H01L21/441;H01L29/43 主分类号 H01L29/82
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