发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition with improved adhesion property to a substrate without decreasing alkali developability. <P>SOLUTION: This photosensitive resin composition contains: a photosensitive resin with an acid value of 20-140 mgKHO/g having one or more radical polymerizable unsaturated bonds and one or more carboxyl groups in one molecule; a compound having one or more amide groups and one or more hydroxyl groups in one molecule; a photoinitiator; and a coloring agent. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010152193(A) |
申请公布日期 |
2010.07.08 |
申请号 |
JP20080331892 |
申请日期 |
2008.12.26 |
申请人 |
NIPPON SHOKUBAI CO LTD |
发明人 |
KAHARA KOJI;ARAKAWA MOTOHIRO;OTSUKI NOBUAKI |
分类号 |
G03F7/038;C08F290/00;C08G59/17;G02B5/20;G03F7/004 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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