发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition with improved adhesion property to a substrate without decreasing alkali developability. <P>SOLUTION: This photosensitive resin composition contains: a photosensitive resin with an acid value of 20-140 mgKHO/g having one or more radical polymerizable unsaturated bonds and one or more carboxyl groups in one molecule; a compound having one or more amide groups and one or more hydroxyl groups in one molecule; a photoinitiator; and a coloring agent. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010152193(A) 申请公布日期 2010.07.08
申请号 JP20080331892 申请日期 2008.12.26
申请人 NIPPON SHOKUBAI CO LTD 发明人 KAHARA KOJI;ARAKAWA MOTOHIRO;OTSUKI NOBUAKI
分类号 G03F7/038;C08F290/00;C08G59/17;G02B5/20;G03F7/004 主分类号 G03F7/038
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