MULTI-BIT FLASH MEMORY AND METHOD FOR MANUFACTURING THE SAME
摘要
<p>Disclosed is a flash memory having at least two gates prepared in one gate structure and a method for manufacturing the same. Each gate can store 1-bit data, and each cell transistor can store at least 2-bit information. In addition, the electric influence from adjacent floating gates is minimized while executing a program because of the varying thicknesses of each tunneling dielectric film. That is to say, electric charge trapping through a certain floating gate can be performed regardless of electromagnetic influence from the adjacent floating gates as a result of the height difference among the floating gates.</p>
申请公布号
WO2010076926(A1)
申请公布日期
2010.07.08
申请号
WO2009KR02388
申请日期
2009.05.07
申请人
INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY;KIM, TAE-WHAN;KWACK, KAE-DAL;KIM, HYUN-JOO