发明名称 MULTI-BIT FERROELECTRIC MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PURPOSE: A multi bit ferroelectric memory device and a manufacturing method thereof are provided to implement a multi bit by applying an electric field with different intensity according to the thickness of the insulation layer even though the same voltage is applied to a top electrode. CONSTITUTION: A multi-bit ferroelectric memory device comprises a bottom electrode, a top electrode(130), and a memory layer(120). The top electrode is formed on the bottom electrode. The memory layer is arranged between the top and bottom electrodes. The memory layer includes a ferroelectric layer and an insulation material pattern(121) on the upper or lower side of the ferroelectric layer. The insulation material pattern includes a first insulation unit with a first thickness and a second insulation unit with a second thickness.</p>
申请公布号 KR20100078140(A) 申请公布日期 2010.07.08
申请号 KR20080136306 申请日期 2008.12.30
申请人 IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) 发明人 CHOI, DUCK KYUN;KIM, YOUNG BAE
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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