发明名称 |
MULTI-BIT FERROELECTRIC MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>PURPOSE: A multi bit ferroelectric memory device and a manufacturing method thereof are provided to implement a multi bit by applying an electric field with different intensity according to the thickness of the insulation layer even though the same voltage is applied to a top electrode. CONSTITUTION: A multi-bit ferroelectric memory device comprises a bottom electrode, a top electrode(130), and a memory layer(120). The top electrode is formed on the bottom electrode. The memory layer is arranged between the top and bottom electrodes. The memory layer includes a ferroelectric layer and an insulation material pattern(121) on the upper or lower side of the ferroelectric layer. The insulation material pattern includes a first insulation unit with a first thickness and a second insulation unit with a second thickness.</p> |
申请公布号 |
KR20100078140(A) |
申请公布日期 |
2010.07.08 |
申请号 |
KR20080136306 |
申请日期 |
2008.12.30 |
申请人 |
IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) |
发明人 |
CHOI, DUCK KYUN;KIM, YOUNG BAE |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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