| 摘要 |
<p>PURPOSE: A method for improving overlay accuracy among different exposure devices is provided to improve the accuracy of an overlay by performing pre-alignment matching, wafer stage grid matching, lens distortion matching. CONSTITUTION: A pre-alignment matching between the different kind exposure equipment is performed(S100). A wafer stage grid matching between the different kind exposure equipment is performed(S102). The lens distortion matching between the different kind exposure equipment is performed(S104).</p> |
