| 摘要 |
<p>PURPOSE: A reticle changer unit of photolithography equipment is provided to simplify exposure equipment by performing a reticle rotation function and a reticle cleaning function at the same time. CONSTITUTION: A rotation cleaning unit(160) is arranged between first and second model case units(140,150). The rotation cleaning unit comprises a sprayed module, a rotation chuck, a motor, and a discharge system. The sprayed module sprays nitrogen on the top side of a reticle. A rotation chuck supports the reticle. The motor rotates the rotation chuck. The exhaust system prevents the particle from being scattered. A PPD(Pellicle Particle Detector) unit(170) confirms whether the reticle cleaning was normally completed or not.</p> |
