发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 A semiconductor device includes a first substrate formed with a through silicon via reaching the back surface thereof, and a second substrate electrically connected to the first substrate via the through silicon via, and bonded to the back surface of the first substrate. A taper angle of a sidewall of a tip end portion of the through silicon via connected to the second substrate is larger than a taper angle of a sidewall of the other portion thereof.
申请公布号 US2010171218(A1) 申请公布日期 2010.07.08
申请号 US20100724090 申请日期 2010.03.15
申请人 PANASONIC CORPORATION 发明人 AOI NOBUO
分类号 H01L23/48;H01L21/768 主分类号 H01L23/48
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