| 摘要 |
PURPOSE: A chamber cover for a deposition apparatus is provided to check the position of a wafer in real time and adjust the position of the wafer using a wafer aligning robot. CONSTITUTION: A main body(240) with a central opening is settled on a protrusion of a chamber inlet. A view port(230) of ring shape is formed in the opening of the main body and includes a transparent window(210) made of a transparent material and a protrusion(220) in which the transparent window is fitted. The protrusion of the view port and the main body are formed of the same material.
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