摘要 |
PURPOSE: A diffusion furnace for manufacturing a semiconductor is provided to prevent the property change of a device by compensating temperature difference between top space and bottom space. CONSTITUTION: A plurality of wafers are installed in a boat. A pedestal(60) transfers the boat upward and downward. The boat is loaded on an internal tube(30) with the drive of the pedestal. An external tube(20) surrounds the internal tube. The top of the external tube is formed into a dome shape. A heater(40) heats the internal space of the external tube. An injector(11a) sprays reaction gas to the wafer loaded in the internal tube.
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