发明名称 RAW MATERIAL FOR PRODUCING SILICON OXIDE, METHOD FOR PRODUCING THE SAME, SILICON OXIDE AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a raw material for producing a silicon oxide and a method for producing the same where a raw material filling rate per the unit volume of a reactor is enhanced without lowering reactivity in silicon oxide production, moisture absorption is suppressed, the silicon oxide having stable physical properties is efficiently produced and the degradation of an equipment member is suppressed. Ž<P>SOLUTION: The raw material for producing the silicon oxide is characterized in that the raw material is produced by sintering a mixture of silicon particles and silicon dioxide particles at 1,000-1,400°C in a non-oxidizing atmosphere and has a loose bulk density of 0.7-2.0 g/cm<SP>3</SP>and a specific surface area measured by a BET one-point method of 0.01-30 m<SP>2</SP>/g. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010150049(A) 申请公布日期 2010.07.08
申请号 JP20080327008 申请日期 2008.12.24
申请人 SHIN-ETSU CHEMICAL CO LTD 发明人 WATANABE KOICHIRO;KASHIDA SHU;FUKUOKA HIROFUMI
分类号 C01B33/113 主分类号 C01B33/113
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