发明名称 SUBSTRATE PROCESSING APPARATUS, VALVE CONTROL METHOD AND PROGRAM THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus wherein a valve opening and closing pattern can be written into a valve controller without requiring manpower, and logging a high-speed switching operation of valves can be logged. Ž<P>SOLUTION: The substrate processing apparatus has: a valve controller 300 for controlling opening and closing operations of a plurality of valves; and a pattern creating device 302 for creating a valve switching pattern for setting the opening and closing state of the plurality of valves. The pattern creating device 302 writes the created valve switching pattern into an inner area of the valve controller, and stores it in a storage medium of the pattern creating device. The valve controller switches a plurality of valves based on the valve switching pattern 306 written into the inner area, writes the state of opening and closing of the plurality of valves at that time into the inner area of the valve controller, and stores it in the pattern creating device. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010153420(A) 申请公布日期 2010.07.08
申请号 JP20080326965 申请日期 2008.12.24
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 KIKUTA YASUSHI
分类号 H01L21/31;C23C16/52;H01L21/314 主分类号 H01L21/31
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