| 摘要 |
The exposure apparatus of the present invention is an exposure apparatus that illuminates an original with light from a light source so as to project a pattern of the original onto a substrate via a projection optical system for exposure, the exposure apparatus comprising a first shutter that shields light passing through a clearance between the light source and the projection optical system, and a control device that controls the opening and closing of the first shutter. While replacing a first original with a second original after an exposure operation has been completed by using the first original, the control device controls the first shutter such that the temperature of the projection optical system approaches closer to the projection optical system's saturation temperature that has been previously obtained via the second original.
|
