| 摘要 |
<p>PURPOSE: An apparatus for detecting the position of a nozzle of coater is provided to evenly coat photoresist on a wafer by detecting and correcting the position of a nozzle each time of replacement the wafer. CONSTITUTION: A light emitting device(100) is arranged in the bottom of a nozzle. A light receiving unit(200) is arranged at the center on the top of a spin chuck. An amplifier(300) amplifies the output signal of the light receiving device. An A/D converter(400) changes an analog signal of the amplifier to a digital signal. A controller(500) analyzes the output of an A/D converter and drive a nozzle drive motor.</p> |
