BATCH TYPE ATOMIC LAYER DEPOSITION APPARATUS

摘要

PURPOSE: A batch type atomic layer deposition device is provided to remove a driving device for the rotational movement of a substrate and a susceptor by executing a deposition process while going up and down inside a process chamber. CONSTITUTION: A process chamber(101) offers space executing a deposition process. A susceptor unit(102) settles a plurality of substrates(10) in an upward and downward direction. The susceptor unit is moved in an upward and downward direction inside the process chamber. A gas injector(105) is included inside the process chamber. The gas injector sprays deposition gas towards the inside of the process chamber in the side part of the substrate. A heater unit(143) heats the deposition gas which is sprayed in the gas injector and the substrate.