发明名称 System and method for power function ramping of microwave linear discharge sources
摘要 <p>One embodiment of the present invention is a system for depositing films on a substrate. This systems includes a vacuum chamber; a linear discharge tube housed inside the vacuum chamber; a magnetron configured to generate a microwave power signal that can be applied to the linear discharge tube; a power supply configured to provide a signal to the magnetron; and a pulse control connected to the power supply. The pulse control is configured to control the duty cycle of the plurality of pulses, the frequency of the plurality of pulses, and/or the contour of the plurality of pulses.</p>
申请公布号 EP1780303(A3) 申请公布日期 2010.07.07
申请号 EP20060022261 申请日期 2006.10.25
申请人 APPLIED MATERIALS, INC.;APPLIED MATERIALS GMBH & CO. KG 发明人 STOWELL, MICHAEL W.;LIEHR, MICHAEL;WIEDER, STEPHAN;DIEGUEZ-CAMPO, JOSE MANUEL
分类号 H01J37/32;C23C16/515 主分类号 H01J37/32
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