System and method for power function ramping of microwave linear discharge sources
摘要
<p>One embodiment of the present invention is a system for depositing films on a substrate. This systems includes a vacuum chamber; a linear discharge tube housed inside the vacuum chamber; a magnetron configured to generate a microwave power signal that can be applied to the linear discharge tube; a power supply configured to provide a signal to the magnetron; and a pulse control connected to the power supply. The pulse control is configured to control the duty cycle of the plurality of pulses, the frequency of the plurality of pulses, and/or the contour of the plurality of pulses.</p>
申请公布号
EP1780303(A3)
申请公布日期
2010.07.07
申请号
EP20060022261
申请日期
2006.10.25
申请人
APPLIED MATERIALS, INC.;APPLIED MATERIALS GMBH & CO. KG
发明人
STOWELL, MICHAEL W.;LIEHR, MICHAEL;WIEDER, STEPHAN;DIEGUEZ-CAMPO, JOSE MANUEL