发明名称 VACUUM PROCESSING DEVICE
摘要 PURPOSE: A vacuum processing device is provided to restrain the generation of the foreign material caused by suction of the air and shorten the time taking for discharging the air by adjusting the discharging rate. CONSTITUTION: A lock chamber(65) is converted into the vacuum atmosphere and the ambient environment. A vacuum pump(44) reduces the lock chamber. A valve(144) is installed in the in-between of an exhaust line(140) connecting the vacuum pump and a lock chamber. A control means controls the opening of valve.
申请公布号 KR20100076852(A) 申请公布日期 2010.07.06
申请号 KR20090016138 申请日期 2009.02.26
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 KOBAYASHI HIROYUKI;MAEDA KENJI;IZAWA MASARU;NAWATA MAKOTO;KIMURA SHINGO
分类号 H01L21/02;H01L21/00 主分类号 H01L21/02
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