SUBSTRATE PROCESSING APPRTUS AND SYSTEM

摘要

PURPOSE: A substrate processing apparatus and a substrate processing system using the same are provided to simplify the facility and manufacturing process by forming a plurality of thin film layers consecutively using single chamber. CONSTITUTION: First and second through holes are respectively formed on an upper surface and a bottom surface of a chamber(1100). A substrate settling unit(1200) is prepared in an internal space of the chamber. A substrate transfer unit(1300) transfers the substrate settling unit forth and back. A gas nozzle unit(1400) respectively sprays a first process gas and a second process gas to a substrate positioned on the substrate settling unit.