| 摘要 |
<p>PURPOSE: A photomask cleaning method is provided to efficiently eliminate the hardening adhesive foreign material attached on the photomask by using the vibration force of a nano particle dispersed in the ultra-pure water. CONSTITUTION: A cleaning bath(100) is prepared for implementation of the washing of the photomask. A predetermined mask pattern(210) is formed on a transparent substrate(200) of the photomask. Photomask is submerged into the ultra-pure water(120) including a particle(110). The foreign material(220) attached on the photomask is removed by vibrating the nano particle.</p> |
