发明名称 METHOD FOR PROCESSING OPTICAL PROXIMITY CORRECTION
摘要 <p>PURPOSE: A method for processing optical proximity correction is provided to increase the accuracy of optical proximity effect correction by reflecting variables changed by freezing and performing modeling for optical proximity correction. CONSTITUTION: A variable is extracted through a first photo process using a mask designed in advance(S210). First modeling is performed using variables extracted through a first photo process(S220). The variable is extracted through a freezing process(S230). Second modeling is performed using variables extracted through the freezing process. The variable is extracted through a second photo process using the designed mask(S250).</p>
申请公布号 KR20100076467(A) 申请公布日期 2010.07.06
申请号 KR20080134528 申请日期 2008.12.26
申请人 HYNIX SEMICONDUCTOR INC. 发明人 PARK, JONG CHEON;CHO, BYUNG UG
分类号 H01L21/027 主分类号 H01L21/027
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