发明名称 |
METHOD FOR PROCESSING OPTICAL PROXIMITY CORRECTION |
摘要 |
<p>PURPOSE: A method for processing optical proximity correction is provided to increase the accuracy of optical proximity effect correction by reflecting variables changed by freezing and performing modeling for optical proximity correction. CONSTITUTION: A variable is extracted through a first photo process using a mask designed in advance(S210). First modeling is performed using variables extracted through a first photo process(S220). The variable is extracted through a freezing process(S230). Second modeling is performed using variables extracted through the freezing process. The variable is extracted through a second photo process using the designed mask(S250).</p> |
申请公布号 |
KR20100076467(A) |
申请公布日期 |
2010.07.06 |
申请号 |
KR20080134528 |
申请日期 |
2008.12.26 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
PARK, JONG CHEON;CHO, BYUNG UG |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|