发明名称 EXPOSING METHOD USING AN EXPOSURE APPARATUS
摘要 <p>PURPOSE: An exposure method using an exposure apparatus is provided to prevent the temperature rise of a focus lens by dividing the focus lens into multiple equal sections and rotating an aperture. CONSTITUTION: A lens is equally divided into multiple domains. An exposure process is performed by rotating an aperture to transmit light on each region. The aperture is a dipole aperture. In the dipole aperture, a light-transmitting part is formed to be symmetrical to each other. According to the angle of the light-transmitting part of the aperture, the rotation angle of the aperture is changed.</p>
申请公布号 KR20100076314(A) 申请公布日期 2010.07.06
申请号 KR20080134325 申请日期 2008.12.26
申请人 HYNIX SEMICONDUCTOR INC. 发明人 CHO, JUNG BIN
分类号 H01L21/027 主分类号 H01L21/027
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