发明名称 Metal and alloy silicides on a single silicon wafer
摘要 Methods and apparatus relating to a single silicon wafer having metal and alloy silicides are described. In one embodiment, two different silicides may be provided on the same wafer. Other embodiments are also disclosed.
申请公布号 US7750471(B2) 申请公布日期 2010.07.06
申请号 US20070823843 申请日期 2007.06.28
申请人 INTEL CORPORATION 发明人 RANADE PUSHKAR
分类号 H01L23/48;H01L21/44;H01L21/4763 主分类号 H01L23/48
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