APPARATUS FOR CLEANING SUBSTRATE

摘要

PURPOSE: A substrate cleaning apparatus is provided to prevent the air leak caused by the deionized water and a suction hole by combining a porosity cleaning plate and manifold using an upper coupling screw which is formed with a through hole communicating with the deionized water and a suction hole. CONSTITUTION: A substrate entry guide portion(100) guides an entry direction of a substrate(10). A foreign body eliminating part eliminates the foreign material formed on the substrate. A foreign material cleaning unit(300) eliminates the foreign material remaining on the substrate. A position controller(400) controls the location of the substrate carried out from the foreign material cleaning unit.