| 摘要 |
A method of manufacturing a photoelectric conversion device. The method includes the steps of arranging a plurality of reticles, on each of which a mask pattern region is formed, in an arrangement direction and using at least two of the plurality of reticles in the method, such that, in at least one of the reticles being used, (i) a center of the at least one reticle, which is aligned with an optical axis of light for exposure, is shifted from (ii) a center of the mask pattern region formed on the at least one reticle, in a direction parallel to the arrangement direction of the plurality of reticles, and performing the exposure of a predetermined region on a wafer using the at least two of the plurality of reticles, in order to manufacture the photoelectric conversion device.
|
