| 摘要 |
<p>The present invention relates to an optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, with at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted, wherein at least one tautening element provided, which facilitates tautening of the membrane layer and wherein the optical membrane element can be used in a projection exposure system, especially for EUV lithography, such that the membrane layer of the membrane element can be adjustably tautened, such that the membrane layer is flat and wherein a method for manufacturing a corresponding optical membrane element is provided, in which a tautening element is generated lithographically together with the membrane layer.</p> |
