PROCESS AND APPARATUS FOR PRODUCING ULTRAPURE WATER, AND METHOD AND APPARATUS FOR CLEANING ELECTRONIC COMPONENT MEMBERS

摘要

This invention provides an apparatus for producing ultrapure water, which can stably produce ultrapure water having a boron concentration of not more than 1 ng/L or a metal concentration of not more than 0.1 ng/L, a process for producing ultrapure water using the apparatus, a method for cleaning electronic component members, and an apparatus for cleaning electronic component members. The apparatus for producing ultrapure water comprises a mixed bed deionization apparatus (16), provided with an anion exchange resin and a cation exchange resin, as a lattermost deionization apparatus. The anion exchange resin is an anion exchange resin having a boron content of not more than 50 μg/L-anion exchange resin (wet state) or an anion exchange resin having a cation elution amount of 100 μg/L-anion exchange resin (wet state).