| 摘要 |
PURPOSE: A manufacturing method for a diamond-like carbon with a smooth surface is provided to obtain a diamond-like carbon film having surface roughness similar to that when there is no interfacial layer by adjusting anode current and substrate bias voltage to a proper range. CONSTITUTION: A manufacturing method for a diamond-like carbon with a smooth surface is as follows. The anode current and substrate bias voltage during formation of a diamond-like carbon film are controlled so that the ratio of the average surface roughness of a coating layer to that of an interfacial layer is kept below 0.2. The proper ranges of the anode current and substrate bias voltage are 0.5~1.0A and more than 2.0KV, respectively. An apparatus for the method comprises a vacuum chamber(1), a substrate transfer and rotation apparatus(13), a substrate holder(2), a substrate(3), a sputtering source(4), a target(5), an ion beam source(6), a filament(7), an anode(8), an ion focusing board(9), a gas injector(10), a substrate bias power source(11), and an argon gas injector(12).
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