| 摘要 |
<p>PURPOSE: A method for detecting defects in a reticle is provided to verify the capabilities of removing and detecting defects by forming a first defect pattern in a pre-defined region. CONSTITUTION: A normal pattern and a first defect pattern are formed in the pre-defined region of a reticle(S1). The first defect pattern is removed(S3). A deformity of the reticle is inspected(S5). A pattern for a semiconductor device is formed through an exposure process with the normal pattern of the reticle(S9). The deformity of the reticle is re-inspected by analyzing the pattern for the semiconductor device(S11).</p> |
