| 摘要 |
PURPOSE: A resist solution and a pattern formation method using thereof are provided to reduce the drying time of the resist solution before transferring the resist solution to a printing plate after coating the resist solution to a blanket. CONSTITUTION: A resist solution contains a base polymer, a tackifier, a carrier solvent, a printing solvent, and a methoxysilane coupling agent including the weak affinity with the carrier solvent. The methoxysilane coupling agent is either n-(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropylimethoxysilane, 3-acryloxypropyltrimethoxysilane, vinyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, p-styryltrimethoxysilane, or 3-methacryloxypropyltrimethoxysilane. The base polymer is either phenol, cresol, novolac, or PMMA(poly methyl methacrylate acrylate). |
