| 摘要 |
<p>PURPOSE: A method for stabilizing wafer exposure is provide to stabilize an exposure by optimally sensing focus variation due to the physical transformation of a lens inside an exposure device. CONSTITUTION: A light shielding film pattern(100,110,120) are arranged on a light transmission substrate with a rod shape separated with a constant space. The light shielding film pattern is divided into upper, middle, and lower sides in a length direction. A phase inversion pattern is alternatively formed on the upper and middle sides. A focus monitoring pattern(400) is formed on the lower side. An overlay error is measured from the upper and lower print patterns on the upper, middle, and lower print regions printed with the focus monitoring pattern to sense the focus variation due to the physical transformation of the lens inside an exposure device.</p> |
