发明名称 |
METHOD FOR FORMING LAYER HAVING UNIFORMED THICKNESS |
摘要 |
PURPOSE: A method for forming a layer with a uniform thickness is provided to improve the thickness uniformity of a thin film on a wafer by suppressing the volatilization of a liquid compound and minimizing the viscosity change. CONSTITUTION: An object to be coated is loaded in a chamber(10). A vaporized auxiliary solvent is injected in the chamber, a remained air in the chamber is discharged through an exhaust pipe(40). An liquid compound is sprayed onto the object to be coated under the vaporized auxiliary solvent atmosphere. The object to be coated rotates to uniform the thickness of the sprayed liquid compound. Air is injected from the outside. The vaporized auxiliary solvent is discharged and the coated object is unloaded.
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申请公布号 |
KR20100074773(A) |
申请公布日期 |
2010.07.02 |
申请号 |
KR20080133288 |
申请日期 |
2008.12.24 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
KIM, HAK JOON;RYU, HAE WOOK |
分类号 |
H01L21/208 |
主分类号 |
H01L21/208 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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