| 摘要 |
PURPOSE: A wiring pattern inspection apparatus is provided to detect a upper part and a lower part of a pattern at the same time. CONSTITUTION: A first illumination unit(1a) projects a light to an inspection region from one side where a wiring pattern of a substrate. A second illumination unit(1b) projects a light to the inspection region from the opposite site of the wring pattern of the substrate. A third illumination unit(1c) projects a light in a direction vertical to the opposite site of the wring pattern of the substrate. An image pickup unit(11) is formed in one side where the wiring pattern of the substrate is formed. A control unit(4) controls the first illumination unit, the second illumination unit, and the third illumination unit.
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