OVERLAY MASK AND METHOD FOR MANUFACTURING THE SAME

摘要

PURPOSE: An overlay mask and a method for manufacturing the same are provided to stabilize a lithography process by etching the quartz board of a mask. CONSTITUTION: A chromic pattern(420) is formed on a quartz board(410) in corresponding to an overlay vernier pattern. A photo-resist pattern(435) for exposing the quartz board through the chromic pattern is formed. The exposed quartz board is partially etched. The overlay vernier pattern is formed into a box or bar type. The etching depth of the quartz board is regulated by the focus differences between overlay regions.