| 摘要 |
PURPOSE: An apparatus for processing a perfluorinated compound is provided to perfectly process CF4 gas which is produced in an etching process during a manufacturing process of a semiconductor production process into harmless gas. CONSTITUTION: An apparatus for processing a perfluorinated compound includes the following: a heat treatment portion(100) treating CF4 gas into harmless gas; a filter processing portion preventing recombination of the CF4 gas at a room temperature; and an absorbent treatment portion(300) processing HF gas which is produced after reaction of CF4 gas. The heat treatment portion includes a combustion chamber portion(110), a circulation tank(120), and a scrubbing treatment portion(130).
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