| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus whose surface material such as a coating is prevented from deteriorating. <P>SOLUTION: A lithographic apparatus includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The lithography apparatus further includes an optical system configured to project an emitted beam, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The lithography apparatus further includes a shield movable into the optical path to restrict the cross-section of the emitted beam to restrict irradiation between the at least two target portions, wherein the surface material between the at least two target portions degrades when irradiated with the emitted beam through the optical system. <P>COPYRIGHT: (C)2010,JPO&INPIT |
