| 摘要 |
<P>PROBLEM TO BE SOLVED: To measure film thickness of an immersion liquid on a substrate when the immersion liquid causing a liquid residue on the substrate is used. <P>SOLUTION: The exposure device for exposing a substrate (5) to light through an immersion liquid includes: a substrate stage (13) capable of moving the substrate (5); an immersion liquid supply means (6) to supply the immersion liquid to a space; an immersion liquid recovery means (7) to recover the immersion liquid from the space; and film thickness measurement means (22, 23) to measure the film thickness of the immersion liquid formed on the substrate (5) after exposure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
