CLEANING TECHNOLOGY OF DEPOSITION CHAMBER USING REMOTE EXCITATION SOURCE

摘要

PROBLEM TO BE SOLVED: To provide an in-situ cleaning method and apparatus which do not cause damages to hardware in a chamber. SOLUTION: The method for cleaning deposition chamber 10 used for producing an electronic device includes the steps of: supplying precursor gas 44 into a remote chamber 46 which is arranged outside the deposition chamber; activating the precursor gas 44 in the remote chamber 46 so as to form reactive chemical species; feeding the reactive chemical species from the remote chamber 46 to the deposition chamber 10; and cleaning the inside of the deposition chamber 10 by using the reactive chemical species which flowed into the deposition chamber 10 from the remote chamber 46. COPYRIGHT: (C)2010,JPO&INPIT