发明名称 Methods of Fabricating Nanostructures
摘要 A method is shown for fabricating nanostructures, and more particularly, to methods of fabricating silicon nanowires. The method of manufacturing a nanowire includes forming a sandwich structure of SiX material and material Si over a substrate and etching the sandwich structure to expose sidewalls of the Si material and the SiX material. The method further includes etching the SiX material to expose portions of the Si material and etching the exposed portions of the Si material. The method also includes breaking away the Si material to form silicon nanowires.
申请公布号 US2010167504(A1) 申请公布日期 2010.07.01
申请号 US20080344696 申请日期 2008.12.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 ANDERSON BRENT A.;BRYANT ANDRES;NOWAK EDWARD J.;SLEIGHT JEFFREY W.
分类号 H01L21/20 主分类号 H01L21/20
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