发明名称 VACUUM PROCESSING APPARATUS
摘要 There is provided a vacuum processing apparatus including a valve whose opening degree can be set to any size and a control computer which automatically controls a depressurizing rate. The vacuum processing apparatus can reduce the number of foreign particles adhered to a sample to be processed in the lock chamber and can improve the throughput at the same time.
申请公布号 US2010163181(A1) 申请公布日期 2010.07.01
申请号 US20090369767 申请日期 2009.02.12
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 KOBAYASHI HIROYUKI;MAEDA KENJI;IZAWA MASARU;NAWATA MAKOTO;KIMURA SHINGO
分类号 H01L21/3065;B05C11/00 主分类号 H01L21/3065
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