发明名称 |
VACUUM PROCESSING APPARATUS |
摘要 |
There is provided a vacuum processing apparatus including a valve whose opening degree can be set to any size and a control computer which automatically controls a depressurizing rate. The vacuum processing apparatus can reduce the number of foreign particles adhered to a sample to be processed in the lock chamber and can improve the throughput at the same time.
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申请公布号 |
US2010163181(A1) |
申请公布日期 |
2010.07.01 |
申请号 |
US20090369767 |
申请日期 |
2009.02.12 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
KOBAYASHI HIROYUKI;MAEDA KENJI;IZAWA MASARU;NAWATA MAKOTO;KIMURA SHINGO |
分类号 |
H01L21/3065;B05C11/00 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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