发明名称 LIGHT REFLECTOR AND SURFACE LIGHT SOURCE APPARATUS
摘要 <p>Disclosed is a light reflector having a substrate layer on which a gloss adjusting layer is formed as an outermost layer.  The surface of the gloss adjusting layer has a 45 degree glossiness in the range of 10 to 80 % and the ratio of 45 degree glossiness/85 degree glossiness is 2 to 25.  The light reflector meets the following &lt;Requirement 1&gt; or &lt;Requirement 2&gt;.  &lt;Requirement 1&gt; is defined by the fact that the gloss adjusting layer comprises (i) a thermoplastic resin and (ii) a filler having an average particle diameter of 2 to 20 µm; has a thickness of 2 to 20 µm; and is at least uniaxially oriented, and that the content of the filler (ii) in the gloss adjusting layer is in the range of 5 to 60 wt%.  &lt;Requirement 2&gt; is defined by the fact that the gloss adjusting layer is a coat layer including a filler, and the average inclination ?a and the reflectance, of the surface of the gloss adjusting layer are 0.04 to 0.2 and 90% or more, respectively.</p>
申请公布号 WO2010073611(A1) 申请公布日期 2010.07.01
申请号 WO2009JP07108 申请日期 2009.12.22
申请人 YUPO CORPORATION;UEDA, TAKAHIKO;HIROI, YOUSUKE;NISHIO, JUN 发明人 UEDA, TAKAHIKO;HIROI, YOUSUKE;NISHIO, JUN
分类号 F21S2/00;G02B5/08;B32B7/02;B32B27/20;F21V7/22;F21Y103/00;G02F1/13357 主分类号 F21S2/00
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