发明名称 |
LIGHT REFLECTOR AND SURFACE LIGHT SOURCE APPARATUS |
摘要 |
<p>Disclosed is a light reflector having a substrate layer on which a gloss adjusting layer is formed as an outermost layer. The surface of the gloss adjusting layer has a 45 degree glossiness in the range of 10 to 80 % and the ratio of 45 degree glossiness/85 degree glossiness is 2 to 25. The light reflector meets the following <Requirement 1> or <Requirement 2>. <Requirement 1> is defined by the fact that the gloss adjusting layer comprises (i) a thermoplastic resin and (ii) a filler having an average particle diameter of 2 to 20 µm; has a thickness of 2 to 20 µm; and is at least uniaxially oriented, and that the content of the filler (ii) in the gloss adjusting layer is in the range of 5 to 60 wt%. <Requirement 2> is defined by the fact that the gloss adjusting layer is a coat layer including a filler, and the average inclination ?a and the reflectance, of the surface of the gloss adjusting layer are 0.04 to 0.2 and 90% or more, respectively.</p> |
申请公布号 |
WO2010073611(A1) |
申请公布日期 |
2010.07.01 |
申请号 |
WO2009JP07108 |
申请日期 |
2009.12.22 |
申请人 |
YUPO CORPORATION;UEDA, TAKAHIKO;HIROI, YOUSUKE;NISHIO, JUN |
发明人 |
UEDA, TAKAHIKO;HIROI, YOUSUKE;NISHIO, JUN |
分类号 |
F21S2/00;G02B5/08;B32B7/02;B32B27/20;F21V7/22;F21Y103/00;G02F1/13357 |
主分类号 |
F21S2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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