| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology for more precisely measuring an optical characteristic of an optical system. <P>SOLUTION: A test mask having a test pattern is held by a mask holding part and is arranged on an object face of the optical system. A position of an image of the test pattern formed on an image face of the optical system is measured. A measuring result is processed so as to decide an optical characteristic of the optical system. A deformation amount of the test mask is measured, and the optical characteristic of the optical system, which is decided by processing the measuring result of the position of the image, is corrected based on the deformation amount. <P>COPYRIGHT: (C)2010,JPO&INPIT |
