| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treatment agent for a freezing process, which can suppress variations in the line width of a first resist pattern and LWR (line width roughness) which may be caused by freezing treatment applied to the first resist pattern and the formation of a second resist pattern in a double patterning method, and to provide a resist pattern formation method using the surface treatment agent. <P>SOLUTION: The surface treatment agent for forming a resist pattern contains a compound (A) having an epoxy skeleton or an oxetane skeleton and resin or oligomer (B) which is inactive to the compound (A) and the resist pattern. <P>COPYRIGHT: (C)2010,JPO&INPIT |
