发明名称 |
POSITIONING APPARATUS, POSITIONING METHOD, POSITIONING PROGRAM AND CUTTING APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To perform efficient positioning while preventing reduction in accuracy when adjusting the position of a pattern, which is caused by blur and position variation of pattern images. Ž<P>SOLUTION: The positioning apparatus includes: a reference pattern setting means 11 for setting the reference pattern of a plurality of patterns P forming a pattern group<SB>Gr</SB>; a pattern image capturing means 12 for acquiring the image data of the pattern P by imaging the pattern P; an error acquisition means 13 for acquiring an error for each pattern by comparing the image data of the pattern P with the reference pattern; a positioning pattern specifying means 14 for specifying at least one valid pattern P<SP>+</SP>or invalid pattern P<SP>-</SP>from the plurality of patterns P on the basis of the error; and a position information calculation means 15 for calculating position information or position adjustment information relating to the pattern group P<SB>Gr</SB>on the basis of at least one valid pattern P<SP>+</SP>or invalid pattern P<SP>-</SP>. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010146438(A) |
申请公布日期 |
2010.07.01 |
申请号 |
JP20080325031 |
申请日期 |
2008.12.22 |
申请人 |
NEC CORP |
发明人 |
NAKAMURA KAZUYOSHI;MATSUMURA KENICHI;OKAMURA ATSUHIRO;TSUKADA SATOSHI |
分类号 |
G06T1/00;B26D5/34 |
主分类号 |
G06T1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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