发明名称 POSITIONING APPARATUS, POSITIONING METHOD, POSITIONING PROGRAM AND CUTTING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To perform efficient positioning while preventing reduction in accuracy when adjusting the position of a pattern, which is caused by blur and position variation of pattern images. Ž<P>SOLUTION: The positioning apparatus includes: a reference pattern setting means 11 for setting the reference pattern of a plurality of patterns P forming a pattern group<SB>Gr</SB>; a pattern image capturing means 12 for acquiring the image data of the pattern P by imaging the pattern P; an error acquisition means 13 for acquiring an error for each pattern by comparing the image data of the pattern P with the reference pattern; a positioning pattern specifying means 14 for specifying at least one valid pattern P<SP>+</SP>or invalid pattern P<SP>-</SP>from the plurality of patterns P on the basis of the error; and a position information calculation means 15 for calculating position information or position adjustment information relating to the pattern group P<SB>Gr</SB>on the basis of at least one valid pattern P<SP>+</SP>or invalid pattern P<SP>-</SP>. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010146438(A) 申请公布日期 2010.07.01
申请号 JP20080325031 申请日期 2008.12.22
申请人 NEC CORP 发明人 NAKAMURA KAZUYOSHI;MATSUMURA KENICHI;OKAMURA ATSUHIRO;TSUKADA SATOSHI
分类号 G06T1/00;B26D5/34 主分类号 G06T1/00
代理机构 代理人
主权项
地址