GAS SUPPLYING APPARATUS, VACUUM PROCESSING APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

摘要

Provided is a gas supplying apparatus (20) which can uniformly supply a gas and can ensure uniform film qualities even when the total length of a gas supplying pipe (21) is long.  The gas supplying apparatus (20) is provided with the gas supplying pipe (21) which is configured using a double pipe composed of an inner pipe (23) connected to a gas introducing pipe (22) and an outer pipe (24) covering the outer circumferential section of the inner pipe (23) with a space therebetween.  The inner pipe (23) has, at least on a part of the pipe, a porous sintered body (25) which passes through the gas, and the outer pipe (24) has a multitude of gas blowout ports (26) from which the gas passed through the sintered body (25) is discharged into a vacuum container.