发明名称 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
摘要 A chemically amplified positive resist composition comprising: a resin comprising a structural unit having an acid-labile group in a side chain and an acid generator wherein the resin contains 40 to 90% by mole of the structural unit having an acid-labile group in a side chain based on all the structural units and the structural unit having an acid-labile group in a side chain contains a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, Z represents a single bond or—(CH2)k—CO—O—, k represents an integer of 1 to 4, R2 is independently in each occurrence a C1-C6 alkyl group, and m represents an integer of 0 to 14.
申请公布号 US2010167199(A1) 申请公布日期 2010.07.01
申请号 US20090641914 申请日期 2009.12.18
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 MIYAGAWA TAKAYUKI;YAMAMOTO SATOSHI;FUJI YUSUKE
分类号 G03F7/004 主分类号 G03F7/004
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