PURPOSE: A transparent conductive film is provided to form a metal electrode of low resistance by forming a laminating structure of an oxide/meta/nitride. CONSTITUTION: A transparent conductive film includes a first transparent layer(120), a metal layer(130) and a second transparent layer(140). The first transparent layer is formed on a substrate(100). The metal layer is formed on the first transparent layer. The second transparent layer is formed on the metal layer. The first transparent layer is made of an oxide film. The first transparent layer has 1.9 or more refractive indexes. The second transparent layer is made of a nitride film or a sulfide film. A total thickness of the second transparent layer and the first transparent layer is 30nm to 70nm.
申请公布号
KR20100073074(A)
申请公布日期
2010.07.01
申请号
KR20080131659
申请日期
2008.12.22
申请人
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
发明人
RYU, MIN KI;HWANG, CHI SUN;PARK, SANG HEE;CHU, HYE YONG;CHO, KYOUNG IK