| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a projection exposure method and a projection exposure device suitable for performing this method. <P>SOLUTION: A projection exposure method for exposing a radiation-sensitive substrate arranged on image surface area of a projection object appliance, which uses at least one image of mask pattern arranged on the object surface area of the projection object appliance, includes the steps of: exposing a substrate by means of a pattern image in valid image sight of the projection object appliance during exposure time interval; and changing relative position between the substrate surface and the focal surface of the projection object appliance during the exposure time interval, by means of a method for exposing an image point in valid image sight at a different focal position of a mask image during the exposure time interval. Active compensation applied to at least one portion of at least one imaging aberration induced by change of focal position during the projection time interval provides an effect that imaging quality is not deteriorated significantly by change of focus during the projection time interval. <P>COPYRIGHT: (C)2010,JPO&INPIT |
