| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a phase shift mask having a new structure. <P>SOLUTION: The phase shift mask is provided with a shielded region having a line pattern formed therein and first and second transparent regions disposed on both sides of the shielded region on a substrate transparent to irradiated light, wherein a phase shifter is formed below the first transparent region and a side wall of the phase shifter has a curved portion convex to the outside. This phase shifter is formed by, for example, causing a femtosecond pulse laser to scan while irradiating it from above the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
