发明名称 ELECTROCHEMICAL PLANARIZATION SYSTEM COMPRISING ENHANCED ELECTROLYTE FLOW
摘要 A polishing pad for an electrochemical planarization tool comprises a patterned surface that forms appropriate electrolyte flow channels for directing an electrolyte from the center to the periphery thereof. Consequently, a continuous electrolyte flow may be established, thereby significantly reducing the accumulation of contaminants in the polishing pad, thereby contributing to enhanced process uniformity so that frequent rinsing of the polishing pad and replacement of the electrolyte solution may be avoided.
申请公布号 US2010163426(A1) 申请公布日期 2010.07.01
申请号 US20090645583 申请日期 2009.12.23
申请人 KIESEL AXEL;GROSCHOPF JOHANNES 发明人 KIESEL AXEL;GROSCHOPF JOHANNES
分类号 C25F3/00;B24B37/04;C25B9/04;C25B15/08 主分类号 C25F3/00
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