| 摘要 |
<p>PURPOSE: A coater unit for a photo-resist coating process is provided to improve an operational environment by completely removing the residue of a photo-resist which is generated during the coating process. CONSTITUTION: A coater cup(100) prevents a photo-resist generated from a coating process from scattering. A spin chuck(110) fixes a wafer(1). A step motor(120) rotates the spin chuck. A nozzle tip(130) sprays the photo-resist on the wafer. Fine residue of the photo-resist is discharged through an outlet. A blowing unit(10) induces air from the upper side to the lower side of the coater cup.</p> |
